Publication:
Impact of plasma density and pattern aspect ratio on plasma damage in deep submicron CMOS technologies
Date
| dc.contributor.author | Creusen, Martin | |
| dc.contributor.author | Van den bosch, G. | |
| dc.contributor.author | van der Groen, Sonja | |
| dc.contributor.author | Groeseneken, Guido | |
| dc.contributor.author | Ackaert, J. | |
| dc.contributor.author | De Backer, E. | |
| dc.contributor.imecauthor | Groeseneken, Guido | |
| dc.date.accessioned | 2021-10-06T10:50:50Z | |
| dc.date.available | 2021-10-06T10:50:50Z | |
| dc.date.issued | 1999 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3321 | |
| dc.source.beginpage | 164 | |
| dc.source.conference | ESSDERC'99 - Proceedings of the 29th European Solid-State Device Research Conference; 13-15 September 1999; Leuven, Belgium. | |
| dc.source.endpage | 167 | |
| dc.title | Impact of plasma density and pattern aspect ratio on plasma damage in deep submicron CMOS technologies | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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