Publication:

Solvent-based strip of high dose ion implanted photoresist

Date

2010
Meeting abstract
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dc.contributor.authorTsvetanova, Diana
dc.contributor.authorVos, Rita
dc.contributor.authorPohland, Maximilian
dc.contributor.authorVanstreels, Kris
dc.contributor.authorFranquet, Alexis
dc.contributor.authorVereecke, Guy
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorTsvetanova, Diana
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.accessioned2021-10-18T22:30:30Z
dc.date.available2021-10-18T22:30:30Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18107
dc.source.conference3rd International Workshop on Plasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate4/03/2010
dc.source.conferencelocationGrenoble France
dc.title

Solvent-based strip of high dose ion implanted photoresist

dc.typeMeeting abstract
dspace.entity.typePublication
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