Publication:

ArF lithography with combination of moderate OAI and attenuated PSM

Date

2001
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Author(s)

Kim, Young-Chang
;
Vandenberghe, Geert  
;
Verhaegen, Staf
;
Ronse, Kurt  

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1993 since deposited on 2021-10-14
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1993 since deposited on 2021-10-14
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Acq. date: 2026-03-17

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