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Characterization and optimization of Cu-low k for 45nm and beyond

Date

2004
Proceedings Paper
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dc.contributor.authorMaex, Karen
dc.contributor.authorBrongersma, Sywert
dc.contributor.authorIacopi, Francesca
dc.contributor.authorTravaly, Youssef
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBruynseraede, Christophe
dc.contributor.authorBeyer, Gerald
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorBrongersma, Sywert
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecBrongersma, Sywert::0000-0002-1755-3897
dc.date.accessioned2021-10-15T14:40:29Z
dc.date.available2021-10-15T14:40:29Z
dc.date.embargo9999-12-31
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9252
dc.source.beginpage10
dc.source.conferenceProceedings 3rd Hiroshima International Workshop on Nanoelectronics for Tera-Bit Information Processing
dc.source.conferencedate6/12/2004
dc.source.conferencelocationHiroshima Japan
dc.source.endpage18
dc.title

Characterization and optimization of Cu-low k for 45nm and beyond

dc.typeProceedings paper
dspace.entity.typePublication
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