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The influence of oxygen on the Hf signal intensity in the characterisation of HfO2/Si stacks
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The influence of oxygen on the Hf signal intensity in the characterisation of HfO2/Si stacks
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Date
2003
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Huyghebaert, Cedric
;
Conard, Thierry
;
Vandervorst, Wilfried
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1768
since deposited on 2021-10-15
Acq. date: 2025-12-15
Citations
Metrics
Views
1768
since deposited on 2021-10-15
Acq. date: 2025-12-15
Citations