Publication:
High-resolution patterning of semiconductors using electron-beam-assisted wet etching
Date
| dc.contributor.author | Richter, G. | |
| dc.contributor.author | Schmidt, G. | |
| dc.contributor.author | Molenkamp, L.W. | |
| dc.contributor.author | Bibus, M. | |
| dc.contributor.author | De Boeck, Jo | |
| dc.contributor.imecauthor | De Boeck, Jo | |
| dc.date.accessioned | 2021-10-14T22:55:35Z | |
| dc.date.available | 2021-10-14T22:55:35Z | |
| dc.date.issued | 2002 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/6758 | |
| dc.source.beginpage | 1693 | |
| dc.source.endpage | 1695 | |
| dc.source.issue | 9 | |
| dc.source.journal | Applied Physics Letters | |
| dc.source.volume | 81 | |
| dc.title | High-resolution patterning of semiconductors using electron-beam-assisted wet etching | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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