Multimode resistive switching in nanoscale hafnium oxide stack as studied by atomic force microscopy

dc.contributor.author	Hou, Yi
dc.contributor.author	Celano, Umberto
dc.contributor.author	Goux, Ludovic
dc.contributor.author	Liu, L.
dc.contributor.author	Degraeve, Robin
dc.contributor.author	Cheng, Y.
dc.contributor.author	Kang, J.
dc.contributor.author	Jurczak, Gosia
dc.contributor.author	Vandervorst, Wilfried
dc.contributor.imecauthor	Celano, Umberto
dc.contributor.imecauthor	Goux, Ludovic
dc.contributor.imecauthor	Degraeve, Robin
dc.contributor.imecauthor	Jurczak, Gosia
dc.contributor.imecauthor	Vandervorst, Wilfried
dc.contributor.orcidimec	Celano, Umberto::0000-0002-2856-3847
dc.contributor.orcidimec	Goux, Ludovic::0000-0002-1276-2278
dc.date.accessioned	2021-10-23T11:20:15Z
dc.date.available	2021-10-23T11:20:15Z
dc.date.embargo	9999-12-31
dc.date.issued	2016
dc.identifier.issn	0003-6951
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/26739
dc.identifier.url	http://scitation.aip.org/content/aip/journal/apl/109/2/10.1063/1.4954258
dc.source.beginpage	23508
dc.source.issue	2
dc.source.journal	Applied Physics Letters
dc.source.volume	109
dc.title	Multimode resistive switching in nanoscale hafnium oxide stack as studied by atomic force microscopy
dc.type	Journal article
dspace.entity.type	Publication
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