Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Articles
Electrical characterization and design optimization of FinFETs with TiN/HfO2 gate stack
Publication:
Electrical characterization and design optimization of FinFETs with TiN/HfO2 gate stack
Date
2009
Journal article
https://doi.org/10.1088/0268-1242/24/12/125001
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
18826.pdf
420.56 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Tsormpatzoglou, A.
;
Tassis, D.H.
;
Dimitriadis, C.A.
;
Mouis, Mireille
;
Ghibaudo, G.
;
Collaert, Nadine
Journal
Semiconductor Science and Technology
Abstract
Description
Metrics
Views
1882
since deposited on 2021-10-18
Acq. date: 2025-10-27
Citations
Metrics
Views
1882
since deposited on 2021-10-18
Acq. date: 2025-10-27
Citations