Publication:

Electrical characterization and design optimization of FinFETs with TiN/HfO2 gate stack

Date

2009
Journal article
https://doi.org/10.1088/0268-1242/24/12/125001
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18826.pdf 420.56 KB

Author(s)

Tsormpatzoglou, A.
;
Tassis, D.H.
;
Dimitriadis, C.A.
;
Mouis, Mireille
;
Ghibaudo, G.
;
Collaert, Nadine  

Journal

Semiconductor Science and Technology

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1884 since deposited on 2021-10-18
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