Publication:
Single-wafer wet cleaning improved by novel high-performance wafer drying
Date
| dc.contributor.author | Mertens, Paul | |
| dc.contributor.author | Marent, Katrien | |
| dc.contributor.imecauthor | Mertens, Paul | |
| dc.contributor.imecauthor | Marent, Katrien | |
| dc.date.accessioned | 2021-10-14T13:22:44Z | |
| dc.date.available | 2021-10-14T13:22:44Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2000 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/4581 | |
| dc.source.beginpage | 113 | |
| dc.source.issue | 9 | |
| dc.source.journal | Solid State Technology | |
| dc.source.volume | 43 | |
| dc.title | Single-wafer wet cleaning improved by novel high-performance wafer drying | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | Original bundle
| |
| Publication available in collections: |