Publication:

Ultra low concentration clean: a new approach to feol critical wafer surface cleaning

Date

2007
Proceedings Paper
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dc.contributor.authorFischer, Thomas
dc.contributor.authorPuri, Suraj
dc.contributor.authorHoyer, Ronald
dc.contributor.authorWostyn, Kurt
dc.contributor.authorJanssens, Tom
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.date.accessioned2021-10-16T16:07:39Z
dc.date.available2021-10-16T16:07:39Z
dc.date.embargo9999-12-31
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12155
dc.source.beginpage167
dc.source.conferenceCleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10
dc.source.conferencedate7/10/2007
dc.source.conferencelocationWashington, DC USA
dc.source.endpage174
dc.title

Ultra low concentration clean: a new approach to feol critical wafer surface cleaning

dc.typeProceedings paper
dspace.entity.typePublication
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