Publication:
Advanced photoresists for 193 nm lithography
Date
| dc.contributor.author | Goethals, Mieke | |
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
| dc.date.accessioned | 2021-10-06T11:12:56Z | |
| dc.date.available | 2021-10-06T11:12:56Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 1999 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3468 | |
| dc.source.beginpage | 143 | |
| dc.source.endpage | 151 | |
| dc.source.issue | 7 | |
| dc.source.journal | Future Fab International | |
| dc.title | Advanced photoresists for 193 nm lithography | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | Original bundle
| |
| Publication available in collections: |