Publication:

Characterization of TiN films deposited by atomic layer deposition

Date

2002
Proceedings Paper
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dc.contributor.authorBesling, W.F.A.
dc.contributor.authorSatta, Alessandra
dc.contributor.authorSchuhmacher, Jörg
dc.contributor.authorBeyer, Gerald
dc.contributor.authorMaex, Karen
dc.contributor.authorKilpela, Olli
dc.contributor.authorSprey, Hessel
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorSprey, Hessel
dc.date.accessioned2021-10-14T21:08:38Z
dc.date.available2021-10-14T21:08:38Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6006
dc.source.beginpage56
dc.source.conferenceProceedings of the 3rd AVS International Conference on Microelectronics and Interfaces
dc.source.conferencedate11/02/2002
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage58
dc.title

Characterization of TiN films deposited by atomic layer deposition

dc.typeProceedings paper
dspace.entity.typePublication
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