Publication:
New wet cleaning technology for highly reliable thin oxides
Date
| dc.contributor.author | Verhaverbeke, Steven | |
| dc.date.accessioned | 2021-09-29T12:52:00Z | |
| dc.date.available | 2021-09-29T12:52:00Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 1994 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/438 | |
| dc.source.conference | Semicon/West : Large Diameter Silicon Wafer Cleaning Technology | |
| dc.source.conferencedate | 18/07/1994 | |
| dc.source.conferencelocation | San Francisco, CA USA | |
| dc.title | New wet cleaning technology for highly reliable thin oxides | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | Original bundle
| |
| Publication available in collections: |