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Effect of top power on a low-k film during oxygen strip in a TCP chamber

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dc.contributor.authorKunnen, Eddy
dc.contributor.authorRakhimova, Tatyana
dc.contributor.authorShamiryan, Denis
dc.contributor.authorStruyf, Herbert
dc.contributor.authorBoullart, Werner
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.accessioned2021-10-18T17:50:59Z
dc.date.available2021-10-18T17:50:59Z
dc.date.issued2010
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17409
dc.source.beginpage462
dc.source.endpage465
dc.source.issue3
dc.source.journalMicroelectronic Engineering
dc.source.volume87
dc.title

Effect of top power on a low-k film during oxygen strip in a TCP chamber

dc.typeJournal article
dspace.entity.typePublication
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