Publication:

Development of a wet silicon removal process for replacement metal gate and sacrificial fin

Date

2011
Proceedings Paper
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dc.contributor.authorSuhard, Samuel
dc.contributor.authorSebaai, Farid
dc.contributor.authorPacco, Antoine
dc.contributor.authorVeloso, Anabela
dc.contributor.authorCarbonell, Laure
dc.contributor.authorClaes, Martine
dc.contributor.authorStruyf, Herbert
dc.contributor.authorMertens, Paul
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorSuhard, Samuel
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-19T19:22:56Z
dc.date.available2021-10-19T19:22:56Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19851
dc.source.beginpage51
dc.source.conferenceSemiconductor Cleaning Science and Technology 12
dc.source.conferencedate10/10/2011
dc.source.conferencelocationBoston, MA USA
dc.source.endpage56
dc.title

Development of a wet silicon removal process for replacement metal gate and sacrificial fin

dc.typeProceedings paper
dspace.entity.typePublication
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