Publication:

Electron-phonon scattering in cold-metal contacted two-dimensional semiconductor devices

Date

2021
Proceedings Paper
https://doi.org/10.1109/SISPAD54002.2021.9592538
Simple item page Full metadata Statistics
 
dc.contributor.authorDuflou, Rutger
dc.contributor.authorHoussa, Michel
dc.contributor.authorAfzalian, Aryan
dc.contributor.imecauthorDuflou, Rutger
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorAfzalian, Aryan
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecDuflou, Rutger::0000-0002-0357-1293
dc.contributor.orcidimecAfzalian, Aryan::0000-0002-5260-0281
dc.date.accessioned2022-04-28T15:24:14Z
dc.date.available2022-04-28T15:24:14Z
dc.date.embargo2023-09-30
dc.date.issued2021
dc.identifier.doi10.1109/SISPAD54002.2021.9592538
dc.identifier.eisbn978-1-6654-0685-7
dc.identifier.issn1946-1569
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39701
dc.publisherIEEE
dc.source.beginpage94
dc.source.conferenceInternational Conference on Simulation of Semiconductor Processes and Devices (SISPAD)
dc.source.conferencedateSEP 27-29, 2021
dc.source.conferencelocationDallas
dc.source.endpage97
dc.source.journalna
dc.source.numberofpages4
dc.title

Electron-phonon scattering in cold-metal contacted two-dimensional semiconductor devices

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
003_Duflou.pdf
Size:
1.91 MB
Format:
Adobe Portable Document Format
Description:
Published version
Download
Publication available in collections:
Conference contributions