Atomic layer deposition of gadolinium aluminate layers using Gd(iPrCp)3, TMA, and O3 or H2O

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Author(s)

Adelmann, Christoph

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Pierreux, Dieter

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Franquet, Alexis

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Conard, Thierry

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Van Bael, Marlies

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Van Elshocht, Sven

Journal

Chemical Vapor Deposition

Metrics

2014 since deposited on 2021-10-18

Acq. date: 2025-10-23