Publication:
Optimizing extreme ultraviolet lithography imaging metrics as a function of absorber thickness and illumination source: a simulation case study of Ta-Co alloy
| dc.contributor.author | Thakare, Devesh | |
| dc.contributor.author | Delabie, Annelies | |
| dc.contributor.author | Philipsen, Vicky | |
| dc.contributor.imecauthor | Thakare, Devesh | |
| dc.contributor.imecauthor | Delabie, Annelies | |
| dc.contributor.imecauthor | Philipsen, Vicky | |
| dc.contributor.orcidimec | Thakare, Devesh::0000-0003-3265-7042 | |
| dc.contributor.orcidimec | Delabie, Annelies::0000-0001-9739-7419 | |
| dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
| dc.date.accessioned | 2024-02-27T09:20:19Z | |
| dc.date.available | 2023-12-15T17:16:55Z | |
| dc.date.available | 2024-02-27T09:20:19Z | |
| dc.date.issued | 2023 | |
| dc.description.wosFundingText | The authors would like to thank Joern-Holger Franke (imec), Peter De Bisschop (imec), Lieve van Look (imec), Vincent Wiaux (imec), Eelco van Setten (ASML) for the technical discussions, and Ulrich Klostermann (Synopsys) for the S-litho software support. The authors have no conflicts of interest to declare. | |
| dc.identifier.doi | 10.1117/1.JMM.22.3.033201 | |
| dc.identifier.issn | 1932-5150 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/43263 | |
| dc.publisher | SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | |
| dc.source.beginpage | Art. 033201 | |
| dc.source.endpage | N/A | |
| dc.source.issue | 3 | |
| dc.source.journal | JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 | |
| dc.source.numberofpages | 18 | |
| dc.source.volume | 22 | |
| dc.subject.keywords | EUV | |
| dc.title | Optimizing extreme ultraviolet lithography imaging metrics as a function of absorber thickness and illumination source: a simulation case study of Ta-Co alloy | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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