Publication:
Actualizing EUV mask model during a reticle's life through TEM/EDX analysis
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0000-0003-2211-9443 | |
| cris.virtual.orcid | 0000-0002-2959-432X | |
| cris.virtual.orcid | 0000-0002-3994-8021 | |
| cris.virtualsource.department | 386aec34-c796-442e-8812-e827cd030994 | |
| cris.virtualsource.department | 0ed0ad17-0b15-4c84-b55a-e2d02d830fa8 | |
| cris.virtualsource.department | df8401d6-bf8a-4030-b504-322d3c8b038d | |
| cris.virtualsource.orcid | 386aec34-c796-442e-8812-e827cd030994 | |
| cris.virtualsource.orcid | 0ed0ad17-0b15-4c84-b55a-e2d02d830fa8 | |
| cris.virtualsource.orcid | df8401d6-bf8a-4030-b504-322d3c8b038d | |
| dc.contributor.author | Jonckheere, Rik | |
| dc.contributor.author | Richard, Olivier | |
| dc.contributor.author | Philipsen, Vicky | |
| dc.contributor.author | Nerke, Eva | |
| dc.date.accessioned | 2026-03-31T08:13:05Z | |
| dc.date.available | 2026-03-31T08:13:05Z | |
| dc.date.createdwos | 2026-02-20 | |
| dc.date.issued | 2025 | |
| dc.description.wosFundingText | The imec authors acknowledge colleagues in the Materials Characterization and Analysis lab for TEM and SEM/FIB, and in the APD department. Also a warm thank you to Devesh Thakare, Larry Melvin (Synopsys) and Toine van den Boogaard, Vidya Vaenkatesan, Mark van de Kerkhof (ASML) for related discussions. Feedback from stakeholders in the EUV mask supply chain and from the IC manufacturing community within imec's AP3 Program has been valuable input. Contributions of partners TNO-UPB-PTB within Task "EUV mask degradation metrology" as part of EU project "14ACMOS" have further inspired. This EU project is supported by the Chips Joint Undertaking and its members, including top-up funding in Flanders. | |
| dc.identifier.doi | 10.1117/12.3073263 | |
| dc.identifier.isbn | 978-1-5106-9320-3 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/58981 | |
| dc.language.iso | eng | |
| dc.provenance.editstepuser | greet.vanhoof@imec.be | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | 136870A | |
| dc.source.conference | Photomask Technology | |
| dc.source.conferencedate | 2025-09-22 | |
| dc.source.conferencelocation | Monterey | |
| dc.source.journal | PHOTOMASK TECHNOLOGY 2025 | |
| dc.source.numberofpages | 8 | |
| dc.title | Actualizing EUV mask model during a reticle's life through TEM/EDX analysis | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| imec.internal.crawledAt | 2026-02-23 | |
| imec.internal.source | crawler | |
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