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Articles
Reliability challenges for copper low-k dielectrics and copper diffusion barriers
Publication:
Reliability challenges for copper low-k dielectrics and copper diffusion barriers
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Date
2005
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11010.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Tokei, Zsolt
;
Li, Yunlong
;
Beyer, Gerald
Journal
Microelectronics Reliability
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1818
since deposited on 2021-10-16
Acq. date: 2025-12-15
Citations
Metrics
Views
1818
since deposited on 2021-10-16
Acq. date: 2025-12-15
Citations