Publication:

Wafer level response to mask deficiencies in 0.55-numerical aperture extreme ultraviolet photolithography

Date

2022
Journal article
https://doi.org/10.1117/1.JMM.21.4.044401
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dc.contributor.authorMelvin III, Lawrence S.
dc.contributor.authorJonckheere, Rik
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.accessioned2023-03-16T10:12:59Z
dc.date.available2023-03-01T03:27:53Z
dc.date.available2023-03-09T08:46:39Z
dc.date.available2023-03-16T10:12:59Z
dc.date.embargo2022-10-31
dc.date.issued2022
dc.identifier.doi10.1117/1.JMM.21.4.044401
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41208
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.beginpage044401
dc.source.endpagena
dc.source.issue4
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages19
dc.source.volume21
dc.title

Wafer level response to mask deficiencies in 0.55-numerical aperture extreme ultraviolet photolithography

dc.typeJournal article
dspace.entity.typePublication
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