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Selective wet removal of the SiN contact etch stop layer prior to S/D contact formation
Publication:
Selective wet removal of the SiN contact etch stop layer prior to S/D contact formation
Date
2018
Proceedings Paper
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38458.pdf
1.47 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Pacco, Antoine
;
Holsteyns, Frank
;
Schaekers, Marc
;
Everaert, Jean-Luc
;
Dictus, Dries
;
Cuypers, Daniel
Journal
Abstract
Description
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1988
since deposited on 2021-10-26
438
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations
Metrics
Views
1988
since deposited on 2021-10-26
438
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations