Publication:

Realizing more accurate OPC models by utilizing SEM contours

Date

2020
Proceedings Paper
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dc.contributor.authorWei, C.
dc.contributor.authorSejpal, R.
dc.contributor.authorDeng, Y.
dc.contributor.authorKusnadi, I.
dc.contributor.authorFenger, G.
dc.contributor.authorOya, M.
dc.contributor.authorOkamoto, Y.
dc.contributor.authorMaruyama, K.
dc.contributor.authorYamazaki, Y.
dc.contributor.authorDas, Sayantan
dc.contributor.authorHalder, Sandip
dc.contributor.authorGillijns, Werner
dc.contributor.imecauthorDas, Sayantan
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorGillijns, Werner
dc.contributor.orcidimecDas, Sayantan::0000-0002-3031-0726
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.date.accessioned2021-10-29T07:59:07Z
dc.date.available2021-10-29T07:59:07Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36318
dc.identifier.urlhttps://doi.org/10.1117/12.2554527
dc.source.beginpage1132524
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXIV
dc.source.conferencedate23/03/2020
dc.source.conferencelocationSan Jose,CA USA
dc.title

Realizing more accurate OPC models by utilizing SEM contours

dc.typeProceedings paper
dspace.entity.typePublication
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