Publication:
Wafer to Wafer Hybrid Bonding Pitch Scaling Challenges (Invited)
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| dc.contributor.author | Van Huylenbroeck, Stefaan | |
| dc.contributor.author | Chew, Soon Aik | |
| dc.contributor.author | Zhang, Boyao | |
| dc.contributor.author | Kang, Shuo | |
| dc.contributor.author | Bogaerts, Lieve | |
| dc.contributor.author | De Messemaeker, Joke | |
| dc.contributor.author | Chery, Emmanuel | |
| dc.contributor.author | Iacovo, Serena | |
| dc.contributor.author | D'havé, Koen | |
| dc.contributor.author | Dewilde, Sven | |
| dc.contributor.author | De Vos, Joeri | |
| dc.contributor.author | Beyne, Eric | |
| dc.contributor.author | Tokei, Zsolt | |
| dc.date.accessioned | 2026-09-14T13:02:27Z | |
| dc.date.available | 2026-09-14T13:02:27Z | |
| dc.date.createdwos | 2026 | |
| dc.date.issued | 2026 | |
| dc.description.abstract | The past years technology aspects of wafer-to-wafer hybrid bonding pitch scaling down to 200nm was documented extensively. This paper discusses specific yield improvement challenges and solutions related to sub-micron scaling, such as wafer-to-wafer bond alignment accuracy, global and local wafer topography control by CMP ensuring void free hybrid bonding, electro-chemical copper corrosion of hybrid pads connected to long metal lines, surface-diffusion-driven copper bulge-out mechanisms, dielectric breakdown and copper diffusion along the bonding interface. | |
| dc.identifier.doi | 10.1109/irps61424.2026.11499286 | |
| dc.identifier.isbn | 979-8-3315-8972-1 | |
| dc.identifier.issn | 1541-7026 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/60357 | |
| dc.language.iso | eng | |
| dc.provenance.editstepuser | greet.vanhoof@imec.be | |
| dc.publisher | IEEE | |
| dc.relation.ispartofseries | International Reliability Physics Symposium | |
| dc.source.beginpage | 1 | |
| dc.source.conference | IEEE International Reliability Physics Symposium (IRPS) | |
| dc.source.conferencedate | 2026-03-22 | |
| dc.source.conferencelocation | Tucson | |
| dc.source.endpage | 9 | |
| dc.source.journal | 2026 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM, IRPS | |
| dc.source.numberofpages | 9 | |
| dc.title | Wafer to Wafer Hybrid Bonding Pitch Scaling Challenges (Invited) | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| imec.internal.crawledAt | 2026-05-08 | |
| imec.internal.source | crawler | |
| imec.internal.wosCreatedAt | 2026-09-11 | |
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