Publication:

Inluence of post exposure bake time on EUV photoresist RLS trade-off

Date

2017

Proceedings Paper

https://doi.org/10.1117/12.2257910

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Author(s)

Vesters, Yannick

;

De Simone, Danilo

;

De Gendt, Stefan

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1918 since deposited on 2021-10-24

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Acq. date: 2026-08-04