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Inluence of post exposure bake time on EUV photoresist RLS trade-off
Publication:
Inluence of post exposure bake time on EUV photoresist RLS trade-off
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Date
2017
Proceedings Paper
https://doi.org/10.1117/12.2257910
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vesters, Yannick
;
De Simone, Danilo
;
De Gendt, Stefan
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Abstract
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Views
1897
since deposited on 2021-10-24
1
last month
1
last week
Acq. date: 2025-12-11
Citations