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Process and properties of ALD tungsten nitride carbide barrier films for interconnects
Publication:
Process and properties of ALD tungsten nitride carbide barrier films for interconnects
Date
2003
Presentation
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Schuhmacher, Jörg
;
Tokei, Zsolt
;
Beyer, Gerald
;
Li, Yunlong
;
Stokhof, Maarten
;
Schaekers, Marc
;
Maex, Karen
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2065
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations
Metrics
Views
2065
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations