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RTN-based defect tracking technique: experimentally probing the spatial and energy profile of the critical filament region and its correlation with HfO2 RRAM switching operation and failure mechanism

Date

2016
Proceedings Paper
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dc.contributor.authorChai, Zheng
dc.contributor.authorMa, Jigang
dc.contributor.authorZhang, Weidong
dc.contributor.authorGovoreanu, Bogdan
dc.contributor.authorSimoen, Eddy
dc.contributor.authorZhang, Jiang
dc.contributor.authorLi, Ziqhiang
dc.contributor.authorGao, R.
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorJurczak, Gosia
dc.contributor.imecauthorGovoreanu, Bogdan
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecGroeseneken, Guido::0000-0003-3763-2098
dc.date.accessioned2021-10-23T10:13:55Z
dc.date.available2021-10-23T10:13:55Z
dc.date.embargo9999-12-31
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26413
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?tp=&arnumber=7573402
dc.source.beginpage122
dc.source.conferenceIEEE Symposium on VLSI Technology
dc.source.conferencedate13/06/2016
dc.source.conferencelocationHonolulu, HI USA
dc.source.endpage123
dc.title

RTN-based defect tracking technique: experimentally probing the spatial and energy profile of the critical filament region and its correlation with HfO2 RRAM switching operation and failure mechanism

dc.typeProceedings paper
dspace.entity.typePublication
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