Publication:
Recent progress in ArF lithography for the 100nm node
Date
| dc.contributor.author | Goethals, Mieke | |
| dc.contributor.author | Vandenberghe, Geert | |
| dc.contributor.author | Pollentier, Ivan | |
| dc.contributor.author | Ercken, Monique | |
| dc.contributor.author | Bisschop, P. | |
| dc.contributor.author | Maenhoudt, Mireille | |
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.imecauthor | Vandenberghe, Geert | |
| dc.contributor.imecauthor | Pollentier, Ivan | |
| dc.contributor.imecauthor | Ercken, Monique | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.orcidimec | Pollentier, Ivan::0000-0002-4266-6500 | |
| dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
| dc.date.accessioned | 2021-10-14T16:58:46Z | |
| dc.date.available | 2021-10-14T16:58:46Z | |
| dc.date.issued | 2001 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5317 | |
| dc.source.beginpage | 333 | |
| dc.source.endpage | 340 | |
| dc.source.issue | 3 | |
| dc.source.journal | J. Photopolymer Science and Technology | |
| dc.source.volume | 14 | |
| dc.title | Recent progress in ArF lithography for the 100nm node | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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