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Study of leaching behavior in immersion lithography by the GSP method

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dc.contributor.authorOkumura, Haruki
dc.contributor.authorMan, N.
dc.contributor.authorKishimura, Shinji
dc.contributor.authorGronheid, Roel
dc.contributor.imecauthorGronheid, Roel
dc.date.accessioned2021-10-16T03:45:38Z
dc.date.available2021-10-16T03:45:38Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10953
dc.source.conference52th Spring Meeting of the Japanese Society of Applied Physics and Related Societies
dc.source.conferencedate29/03/2005
dc.source.conferencelocationSaitama Japan
dc.title

Study of leaching behavior in immersion lithography by the GSP method

dc.typeProceedings paper
dspace.entity.typePublication
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