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Conference contributions
Screening the high-k layer quality by means of open circuit potential analysis and wet chemical etching
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Screening the high-k layer quality by means of open circuit potential analysis and wet chemical etching
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Date
2003
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Claes, Martine
;
De Gendt, Stefan
;
Witters, Thomas
;
Kaushik, Vidya
;
Chen, Jerry
;
Conard, Thierry
;
Delabie, Annelies
;
Van Elshocht, Sven
;
Heyns, Marc
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1934
since deposited on 2021-10-15
4
last month
Acq. date: 2025-12-09
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Metrics
Views
1934
since deposited on 2021-10-15
4
last month
Acq. date: 2025-12-09
Citations