Publication:

Reticle imaging and metrology using a CD-SEM at IMEC

Date

2000
Proceedings Paper
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dc.contributor.authorJames, A.
dc.contributor.authorFelten, F.
dc.contributor.authorPolli, M.
dc.contributor.authorEngland, J.
dc.contributor.authorMarschner, Thomas
dc.contributor.authorVandenberghe, Geert
dc.contributor.imecauthorVandenberghe, Geert
dc.date.accessioned2021-10-14T13:06:08Z
dc.date.available2021-10-14T13:06:08Z
dc.date.embargo9999-12-31
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4447
dc.source.beginpage128
dc.source.conference16th European Conferenc on Mask Technology for Integrated Circuits and Microcomponents
dc.source.conferencelocation
dc.source.endpage133
dc.title

Reticle imaging and metrology using a CD-SEM at IMEC

dc.typeProceedings paper
dspace.entity.typePublication
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