ESD performance comparison of superlattice I/O FinFET and horizontal nanowire devices

dc.contributor.author	Simicic, Marko
dc.contributor.author	Chen, Shih-Hung
dc.contributor.author	Hellings, Geert
dc.contributor.author	Linten, Dimitri
dc.contributor.imecauthor	Simicic, Marko
dc.contributor.imecauthor	Chen, Shih-Hung
dc.contributor.imecauthor	Hellings, Geert
dc.contributor.imecauthor	Linten, Dimitri
dc.contributor.orcidimec	Simicic, Marko::0000-0002-3623-1842
dc.contributor.orcidimec	Hellings, Geert::0000-0002-5376-2119
dc.contributor.orcidimec	Linten, Dimitri::0000-0001-8434-1838
dc.date.accessioned	2021-10-26T03:50:52Z
dc.date.available	2021-10-26T03:50:52Z
dc.date.embargo	9999-12-31
dc.date.issued	2018
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/31778
dc.identifier.url	https://www.esda.org/assets/IEW/2018IEWProgram.pdf
dc.source.beginpage	B.5
dc.source.conference	12th International Electrostatic Discharge Workshop- IEW
dc.source.conferencedate	14/05/2018
dc.source.conferencelocation	Corsendonk Belgium
dc.title	ESD performance comparison of superlattice I/O FinFET and horizontal nanowire devices
dc.type	Proceedings paper
dspace.entity.type	Publication
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