Publication:

Multiple patterning: a path towards sub-20nm hp

Date

2010
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dc.contributor.authorVandenberghe, Geert
dc.contributor.authorWong, Patrick
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorBekaert, Joost
dc.contributor.authorLaenens, Bart
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorVersluijs, Janko
dc.contributor.authorWiaux, Vincent
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.accessioned2021-10-18T23:19:02Z
dc.date.available2021-10-18T23:19:02Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18212
dc.source.conferenceSemicon Japan
dc.source.conferencedate1/12/2010
dc.source.conferencelocationChiba Japan
dc.title

Multiple patterning: a path towards sub-20nm hp

dc.typeOral presentation
dspace.entity.typePublication
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