Publication:
Experimental determination of the maximum post-process annealing temperature for standard CMOS wafers
Date
| dc.contributor.author | Sedky, Sherif | |
| dc.contributor.author | Witvrouw, Ann | |
| dc.contributor.author | Bender, Hugo | |
| dc.contributor.author | Baert, Kris | |
| dc.contributor.imecauthor | Bender, Hugo | |
| dc.date.accessioned | 2021-10-14T17:47:25Z | |
| dc.date.available | 2021-10-14T17:47:25Z | |
| dc.date.issued | 2001 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5642 | |
| dc.source.beginpage | 377 | |
| dc.source.endpage | 385 | |
| dc.source.issue | 2 | |
| dc.source.journal | IEEE Trans. Electron Devices | |
| dc.source.volume | 48 | |
| dc.title | Experimental determination of the maximum post-process annealing temperature for standard CMOS wafers | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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