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Lithography options for the 32nm half pitch node and beyond
Publication:
Lithography options for the 32nm half pitch node and beyond
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Date
2008
Proceedings Paper
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17719.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ronse, Kurt
;
Jansen, Philippe
;
Gronheid, Roel
;
Hendrickx, Eric
;
Maenhoudt, Mireille
;
Goethals, Mieke
;
Vandenberghe, Geert
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1929
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Acq. date: 2025-12-11
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Views
1929
since deposited on 2021-10-17
1
last month
Acq. date: 2025-12-11
Citations