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Mechanistic and electrochemical aspects of copper and cobalt post CMP cleaners for 5-7 nm nodes
Publication:
Mechanistic and electrochemical aspects of copper and cobalt post CMP cleaners for 5-7 nm nodes
Date
2017
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
White, Mike
;
White, Daniela
;
Wang, Volley
;
Liu, Jun
;
Thomas, Elisabeth
;
Frye, Don
;
Lieten, Ruben
;
Parson, Thomas
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Abstract
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1828
since deposited on 2021-10-24
Acq. date: 2025-10-27
Citations
Metrics
Views
1828
since deposited on 2021-10-24
Acq. date: 2025-10-27
Citations