Publication:

Atomic layer processing of 2D materials for beyond CMOS applications

Date

2016
Meeting abstract
Simple item page Full metadata Statistics
 
dc.contributor.authorDelabie, Annelies
dc.contributor.authorCaymax, Matty
dc.contributor.authorGroven, Benjamin
dc.contributor.authorHeyne, Markus
dc.contributor.authorZhang, Haodong
dc.contributor.authorChiappe, Daniele
dc.contributor.authorHeyns, Marc
dc.contributor.authorRadu, Iuliana
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorGroven, Benjamin
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.orcidimecGroven, Benjamin::0000-0002-5781-7594
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.date.accessioned2021-10-23T10:31:29Z
dc.date.available2021-10-23T10:31:29Z
dc.date.embargo9999-12-31
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26530
dc.source.conferenceInternational Conference on Atomic Layer Deposition - ALD
dc.source.conferencedate24/07/2016
dc.source.conferencelocationDublin Ireland
dc.title

Atomic layer processing of 2D materials for beyond CMOS applications

dc.typeMeeting abstract
dspace.entity.typePublication
Files

Original bundle

Name:
33801.pdf
Size:
54.17 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions