Publication:
Gray bar masking: fabrication and imaging for 193 nm
Date
| dc.contributor.author | Smith, Bruce | |
| dc.contributor.author | Vandenberghe, Geert | |
| dc.contributor.author | Martin, P. W. | |
| dc.contributor.author | Rack, P. | |
| dc.contributor.author | Hsu, S. | |
| dc.contributor.author | Chen, F. | |
| dc.contributor.imecauthor | Vandenberghe, Geert | |
| dc.date.accessioned | 2021-10-14T17:51:51Z | |
| dc.date.available | 2021-10-14T17:51:51Z | |
| dc.date.issued | 2001 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5667 | |
| dc.source.conference | 21st Annual BACUS Symposium on Photomask Technology; October 2001; Monterey, CA, USA. | |
| dc.source.conferencelocation | ||
| dc.title | Gray bar masking: fabrication and imaging for 193 nm | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
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