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Megasonic, non-contact cleaning followed by "Rotagoni" drying of CMP wafers
Publication:
Megasonic, non-contact cleaning followed by "Rotagoni" drying of CMP wafers
Date
2001
Proceedings Paper
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5445.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lauerhaas, Jeff
;
Mertens, Paul
;
Nicolosi, T.
;
Kenis, Karine
;
Fyen, Wim
;
Heyns, Marc
Journal
Abstract
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2054
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations
Metrics
Views
2054
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations