Publication:
Recent trends and progress in DUV lithography
Date
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.author | Goethals, Mieke | |
| dc.contributor.author | Vandenberghe, Geert | |
| dc.contributor.author | Maenhoudt, Mireille | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.imecauthor | Vandenberghe, Geert | |
| dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
| dc.date.accessioned | 2021-10-14T11:35:45Z | |
| dc.date.available | 2021-10-14T11:35:45Z | |
| dc.date.issued | 1999 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3779 | |
| dc.source.beginpage | 34 | |
| dc.source.conference | Lithography for Semiconductor Manufacturing; 19-21 May 1999; Edinburgh, UK. | |
| dc.source.conferencelocation | ||
| dc.source.endpage | 39 | |
| dc.title | Recent trends and progress in DUV lithography | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |