Publication:

Observation of plasma-induced damage in bulk germanium p-type FinFET devices and curing in high-pressure anneal

Date

2019
Journal article
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dc.contributor.authorHiblot, Gaspard
dc.contributor.authorArimura, Hiroaki
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorChiu, Eddie
dc.contributor.authorLiu, Yefan
dc.contributor.authorMitard, Jerome
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorCollaert, Nadine
dc.contributor.authorVan der Plas, Geert
dc.contributor.imecauthorHiblot, Gaspard
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorLiu, Yefan
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorVan der Plas, Geert
dc.contributor.orcidimecHiblot, Gaspard::0000-0002-3869-965X
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecVan der Plas, Geert::0000-0002-4975-6672
dc.date.accessioned2021-10-27T10:27:01Z
dc.date.available2021-10-27T10:27:01Z
dc.date.issued2019
dc.identifier.issn1530-4388
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33156
dc.identifier.urlhttps://ieeexplore.ieee.org/document/8672823
dc.source.beginpage468
dc.source.endpage470
dc.source.issue2
dc.source.journalIEEE Transactions on Device and Materials Reliability
dc.source.volume19
dc.title

Observation of plasma-induced damage in bulk germanium p-type FinFET devices and curing in high-pressure anneal

dc.typeJournal article
dspace.entity.typePublication
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