Publication:
Protective films formed during the etching of TiSi2 and CoSi2 in F-based plasmas
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1958 since deposited on 2021-09-29
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Acq. date: 2026-09-16
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Statistics
Views
1958 since deposited on 2021-09-29
1last month
1last week
Acq. date: 2026-09-16
Citations