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Impact of plasma pretreatment and pore size on the sealing of ultra low-k dielectrics by self-assembling monolayers
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Impact of plasma pretreatment and pore size on the sealing of ultra low-k dielectrics by self-assembling monolayers
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Date
2014
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28213.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Sun, Yiting
;
Krishtab, Mikhail
;
Struyf, Herbert
;
Verdonck, Patrick
;
De Feyter, Steven
;
Baklanov, Mikhaïl
;
Armini, Silvia
Journal
Langmuir
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1883
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Acq. date: 2026-01-06
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Views
1883
since deposited on 2021-10-22
2
last month
2
last week
Acq. date: 2026-01-06
Citations