Publication:
Impact of illumination source symmetrization in OPC
Date
| dc.contributor.author | Sturtevant, John L. | |
| dc.contributor.author | Hong, Le | |
| dc.contributor.author | Jayaram, Srividya | |
| dc.contributor.author | Renwick, Stephen P. | |
| dc.contributor.author | McCallum, Martin | |
| dc.contributor.author | De Bisschop, Peter | |
| dc.contributor.imecauthor | De Bisschop, Peter | |
| dc.date.accessioned | 2021-10-17T11:04:16Z | |
| dc.date.available | 2021-10-17T11:04:16Z | |
| dc.date.issued | 2008 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/14523 | |
| dc.source.beginpage | 70283M | |
| dc.source.conference | Photomask and Next-Generation Lithography Mask Technology XV | |
| dc.source.conferencedate | 16/04/2008 | |
| dc.source.conferencelocation | Yokohama Japan | |
| dc.title | Impact of illumination source symmetrization in OPC | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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