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Material characteristics and damascene patterning of a fluoropolymer low-k film
Publication:
Material characteristics and damascene patterning of a fluoropolymer low-k film
Date
2000
Presentation
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Struyf, Herbert
;
Donaton, R. A.
;
Lepage, Muriel
;
Lanckmans, Filip
;
Vereecke, Guy
;
Maex, Karen
;
Vanhaelemeersch, Serge
;
Scheid, D.
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1964
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations
Metrics
Views
1964
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations