Publication:
Random deposition as a growth mode in atomic layer deposition
Date
| dc.contributor.author | Puurunen, Riikka | |
| dc.date.accessioned | 2021-10-15T15:38:41Z | |
| dc.date.available | 2021-10-15T15:38:41Z | |
| dc.date.issued | 2004 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/9471 | |
| dc.source.beginpage | 159 | |
| dc.source.endpage | 170 | |
| dc.source.issue | 3 | |
| dc.source.journal | Chemical Vapor Deposition | |
| dc.source.volume | 10 | |
| dc.title | Random deposition as a growth mode in atomic layer deposition | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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