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CD-control comparison for sub-0.18μm patterning using 248 nm lithography and strong resolution enhancement techniques
Publication:
CD-control comparison for sub-0.18μm patterning using 248 nm lithography and strong resolution enhancement techniques
Date
1999
Proceedings Paper
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3921.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vandenberghe, Geert
;
Marschner, Thomas
;
Ronse, Kurt
;
Socha, R.
;
Dusa, M.
Journal
Abstract
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2
since deposited on 2021-10-14
Acq. date: 2025-10-23
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2112
since deposited on 2021-10-14
Acq. date: 2025-10-23
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Downloads
2
since deposited on 2021-10-14
Acq. date: 2025-10-23
Views
2112
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations