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Influence of CH4H2 reactive ion etching on the electrical and optical properties of AlGaAs/InGaAs/GaAs heterostructures
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Influence of CH4H2 reactive ion etching on the electrical and optical properties of AlGaAs/InGaAs/GaAs heterostructures
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1994
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
van Es, C. M.
;
Eijkemans, T. J.
;
Wolter, J. H.
;
Pereira, Ricardo
;
Van Hove, Marleen
;
Van Rossum, Marc
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2036
since deposited on 2021-09-29
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Acq. date: 2025-12-15
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Metrics
Views
2036
since deposited on 2021-09-29
1
last month
Acq. date: 2025-12-15
Citations