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Plasma-induced damage reduction in porous SiOCH dielectrics by replacement of H2 and N2 by CH2F2 and Ar in fluorocarbon based plasmas

Date

2011
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dc.contributor.authorSouriau, Laurent
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorCarbonell, Laure
dc.contributor.authorCiofi, Ivan
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.date.accessioned2021-10-19T19:05:44Z
dc.date.available2021-10-19T19:05:44Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19815
dc.source.conferenceAVS 58th International Symposium and Exhibition
dc.source.conferencedate30/10/2011
dc.source.conferencelocationNashville, TN USA
dc.title

Plasma-induced damage reduction in porous SiOCH dielectrics by replacement of H2 and N2 by CH2F2 and Ar in fluorocarbon based plasmas

dc.typeMeeting abstract
dspace.entity.typePublication
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