Publication:

Understanding the potential and limitations of the HfAlO as interpoly dielectric in floating gate flash memory

Date

2009
Journal article
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dc.contributor.authorGovoreanu, Bogdan
dc.contributor.authorDegraeve, Robin
dc.contributor.authorZahid, Mohammed
dc.contributor.authorNyns, Laura
dc.contributor.authorCho, Moon Ju
dc.contributor.authorKaczer, Ben
dc.contributor.authorJurczak, Gosia
dc.contributor.authorKittl, Jorge
dc.contributor.authorGroeseneken, Guido
dc.contributor.imecauthorGovoreanu, Bogdan
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.date.accessioned2021-10-17T22:30:49Z
dc.date.available2021-10-17T22:30:49Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15384
dc.source.beginpage1807
dc.source.endpage1811
dc.source.issue7_9
dc.source.journalMicroelectronic Engineering
dc.source.volume86
dc.title

Understanding the potential and limitations of the HfAlO as interpoly dielectric in floating gate flash memory

dc.typeJournal article
dspace.entity.typePublication
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